FAQ


Contact Us | LogIn     
Search
1546-2080 Online :: 1546-203X Print
A Brief Review of U.S. and Korean Patent Invalidity Decisions for CMP Slurry Patents
Volume 8, Issue 2


Authors:
Patrick P. Hansen and Donald J. Featherstone

Abstract:
Few nanotechnology patents have been tested in court, either in the United States or abroad. This article reviews the treatment of Chemical Mechanical Planarization (CMP) slurry patents asserted in U.S. and Korean courts. While a jury in a U.S. District Court found Cabot Microelectronics Corporation's patents not to be invalid, Korean Courts found Cabot's CMP Korean patent to be invalid. Invalidity trends in the U.S. and Korea are also discussed.

Full Text (PDF)
Home   :   Aims & Scope    :   Editorial Board    :   Subscriptions   :   Partnerships  :   Disclaimer  :   Contact Us
Nanotechnology Law & Business Copyright 2005